Photomask for Even UV Illumination
We developed tools for measuring and correcting even illumination in 3D printers. A CdS photoresistor and Arduino were used to measure the intensity of ultraviolet light at positions (using a grid template) above the LCD display. The values were then input into the NanoDLP mask generation software to generate a UV photomask to correct for uneven illumination. The correction increased the useable print area and resulted in unform curing along the xy plane.
The code used for measuring the photoresistor values is available here.